American lab is developing a BAT laser that could enable ‘beyond EUV’ lithography, provide 10X power efficiency boost – Salmigondis

American lab is developing a BAT laser that could enable 'beyond EUV' lithography, provide 10X power efficiency boost

American Lab Is Developing A Bat Laser That Could Enable 'beyond Euv' Lithography, Provide 10x Power Efficiency Boost

Petawatt-class thulium lasers could replace CO2 lasers in lithography machines down the road.

Source: Latest from Tomshardware – Read More

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